Abstract: The study provides an in-depth exploration of the design and implementation of the control system for the 400 kV ion implanter developed by the China Institute of Atomic Energy. First, it introduces the composition and structure of the ion implanter and its associated equipment, detailing the physical layout of the device, system architecture design, as well as the hardware design of the lower computer based on Siemens PLC and the upper computer software implementation using EPICS. Secondly, the design of the ion implanter control interface is achieved using the EPICS OPI tool, CS-Studio software. Finally, the study discusses the specific implementation of various anti-interference measures and safety interlock designs, along with on-site debugging.